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Joseph R.
Flemish
Senior Scientist and Professor of Materials Science and Engineering
314 Applied Science Bldg
814-865-0942
flemish@matse.psu.edu |
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Research
Interests:
• Processing
and characterization of electronic materials and
devices
• Plasma-assisted deposition and etching techniques
• Wide bandgap semiconductor technology
• Process development and integration for high-power
and
high-frequency
devices.
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Areas of Research:
Professor Flemish joined Penn State in 2004 from the electronics
industry where he was responsible for technology development
related to the manufacturing of GaAs integrated circuits
for microwave based communications. His research activities
focus on the development of process technologies for electronic
materials and devices, particularly those used in high power
and high frequency applications.
Development of emerging wide bandgap semiconductor technology
where many device characteristics are still governed by materials
quality and process induced defects is a particular focus area. For
example, high electron mobility transistors (HEMTs) made based
on aluminum gallium nitride heterostructures are promising
for future power amplifiers used in radar and cellular communications. However,
reliability of these devices still suffers from problems caused
by materials and process induced defects. Professor
Flemish is presently investigating how processing methodologies
associated with these devices affect their performance and
improve their reliability. In this work the effects of
controllable parameters associated with chemical vapor deposition,
plasma-assisted etching, and surface modification on the performance
of these devices are of central interest.
Other
wide bandgap semiconductor efforts involve collaborations with
government and industrial partners for the advancement of high-power
silicon carbide devices and assessment of their reliabilty
for future electrical distribution systems.
Additionally,
Flemish is involved in employing electronic materials in new
structures to create reconfigurable antennas and tunable microwave
components for greater efficiency and functionality of microwave
based communications systems.
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Technologies
impacted by research:
Technologies impacted
include semiconductor devices, microwave communications,
radar systems and imaging, high-power electrical distribution
systems.
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Journal
Articles and Publications:
1. J. R. Flemish, Dry Etching of SiC, in Wide Bandgap
Semiconductors, ed. S. J. Pearton, (William Andrew Publishing
and Noyes Publishing,
New York, (2000), pp. 151 –176.
2. T. Burke, K. Xie, H. Singh, T. Podlesak, J. Flemish, J.
Carter, S. Schneider, J. H. Zhao,
"Silicon Carbide Thyristors for Electric Guns,” IEEE
Transactions on Magnetics Vol. 33 (1), 432 (1997).
3. R. T. Lareau, K. A. Jones, T. Monahan, J. R. Flemish, R.
L. Pfeffer, C. E. Stutz, R. Jones, C. W. Litton, R. E. Sherriff,
D. C. Look, “Comparison of OMVPE and MBE grown AlGaAs/InGaAs
PHEMT Structures,” Journal of Crystal Growth 167 (3),
406 (1996).
4. J. R. Flemish, S. N. Schauer, R. Wittstruck, M. I. Landstrass,
and M. I. Plano, " Growth and Characterization of Phosphorus-Doped
Diamond Films, Diamond and Related Materials 3, 672 (1994).
5. J. R. Flemish and R. Pfeffer, "Low Hydrogen Content
Silicon Nitride Films Deposited a t Very Low Silane Pressures
from
ECR Plasmas," J. Appl. Phys. 74, 3277 (1993).
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