David Saint John, a 2012 MatSC grad and instructor in Penn State's College of...
Venkatraman Gopalan
Professor of Materials Science and Engineering
Associate Director, Center for Optical Technologies
N-212 Millennium Science Complex
(814) 865-2910
gopalan@matse.psu.edu
http://www.mri.psu.edu/Faculty/Gopalan/
Dr. Gopalan received his B.Tech. in Metallurgical Engineering from the Indian Institute of Technology, Chennai, in 1989, and his Ph.D. in Materials Science and Engineering from Cornell University in 1995. He was a postdoctoral scholar in the Electrical and Computer Engineering Department at the Carnegie Mellon University from 1995-1996, and was subsequently awarded a director funded postdoctoral fellowship at the Los Alamos National Laboratory, where he performed research on ferroelectrics and electro-optics till 1998.
He joined Pennsylvania State University as an assistant professor in December 1998, and became a full professor in 2007. He has been awarded the National Science Foundation CAEEER award (2000), Robert R. Coble Award from the American ceramics Society (2002), Corning Faculty fellowship in Ceramic Sciences (2004), National Research Council Faculty Fellowship (2004), Wilson award for excellence in research (2005), Eshbach Faculty Fellow at the Northwestern University (2007), Richard M. Fulrath award from the American ceramics Society (2009).
He is the associate director of the Center for Optical Technologies since 2003, has served on the editorial board of the Annual Reviews of Materials research since 2004, and served as the Chairman of the User Executive Committee for the Center for Nanophase Materials Science, Oak Ridge National Laboratory, in 2010-11. Gopalan has published over 150 papers, and has written five book chapters on ferroelectric complex oxides, nonlinear optics, optical metamaterials, and scanning probe microscopy.
Our research focuses on the science and technology of nonlinear optical materials. The work straddles materials science, physics, and optical engineering. We have three areas of current interest:
Experimental tools include ultrafast femtosecond lasers, electro-optics and fiber optics, scanning probe microscopies, dielectric and magnetic measurements, clean room, cryogenics, and simulations based on home-written MATLAB as well as commercial codes.
Multiferroics enable electrical control of magnetic devices, and vice versa, and dual electrical-magnetic storage media. Nonlinear optical devices are targeted for optical communications and infrared applications. The vision of hybrid semiconductor-metal-silica structures is all-fiber optoelectronics, where light generation, modulation and detection can be performed within a fiber.
V. Gopalan, D. B. Litvin, “New symmetries in crystals and handed structures,” Nature Materials , DOI: 10.1038/nmat2987 (2011). http://www.nature.com/nmat/journal/vaop/ncurrent/abs/nmat2987.html
J. R. Sparks, R. He, Noel Healy, M. Krishnamurthi, A. C. Peacock, P. J.A. Sazio, V. Gopalan, and J. V. Badding, “Low loss ZnSe Optical Fiber Waveguides,” Advanced Materials, 23, 1647-1651 (2011).
A. Vasudevarao, A. N. Morozovska, I. Grinberg, S. Bhattacharya, Y. Li, S. Jesse, P. Wu, K. Seal, S. Choudhury, E.A. Eliseev, S. Svechnikov, D. Lee, S. Phillpot, L.Q. Chen, A. M. Rappe, V. Gopalan and S.V. Kalinin, “Correlated polarization switching in the proximity of a 180 degree domain wall,” Phys. Rev. B. 82, 024111 (2010).
J. H. Lee, L. Fang, E. Vlahos, X. Ke, Y. W. Jung, L. Fitting Kourkoutis, J.W. Kim, P. Ryan, T. Heeg, M. Roeckerath, V. Goian, M. Bernhagen, R. Uecker, P. C. Hammel, K. M. Rabe, S. Kamba, J. Schubert, J. W. Freeland, D. A. Muller, C. J. Fennie, P. Schiffer, V. Gopalan, E. Johnston-Halperin & D. G. Schlom, “Creating a Strong Ferroelectric Ferromagnet via Spin-Phonon Coupling,” Nature 466, 954 (2010).
I. A. Temnykh, N. F. Baril, Z. Liu, J. V. Badding, V. Gopalan, “Optical multistability in a silicon-core silica-cladding fiber,” Optics Express, 18, 5305-5313 (2010).
Joan M. Redwing
Professor of Materials Science and Engineering, Chemical Engineering & Electrical Engineering
Chair, Intercollege Graduate Degree Program in Materials Science and Engineering
101 Steidle Building
(814) 865-8665
redwing@matse.psu.edu
http://www.personal.psu.edu/jmr31/
Joan M. Redwing received her B.S. in Chemical Engineering from the University of Pittsburgh and her Ph.D. in Chemical Engineering from the University of Wisconsin-Madison. She was employed as a research engineer at Advanced Technology Materials, Inc. from 1994-1999 working on metalorganic chemical vapor deposition of group III-nitride materials. Dr. Redwing joined the faculty of the Department of Materials Science and Engineering at Penn State University in 2000. She holds a joint appointment in the Department of Electrical Engineering and is a member of the Materials Research Institute. Dr. Redwing’s research interests are in the general area of electronic materials synthesis and characterization with a specific emphasis on semiconductor thin film and nanostructure fabrication by chemical vapor deposition. She currently serves as secretary of the American Association for Crystal Growth and is an associate editor for the Journal of Crystal Growth. She is a co-author on over 130 publications in refereed journals and holds 8 U.S. patents.
Dr. Redwing’s research interests lie in the general area of electronic and optoelectronic materials synthesis and characterization with a special emphasis on chemical vapor deposition processing of semiconductor thin films and nanostructures. A current area of research focuses on the growth of semiconductor nanowires utilizing a combination of templating and directed growth techniques. This work is aimed at understanding the fundamental mechanisms of nanowire growth and the impact of nanoscale phenomena on materials synthesis. The fabrication of radial and axial nanowire heterostructures and p-n junctions is also under investigation for nanoscale device development. This research is an integral part of several multidisciplinary research team projects at Penn State which are focused on the development of nanowire-based devices for applications in microelectronics, chemical and biological sensing and solar energy conversion. The deposition of wide bandgap group III-nitride ((Al,Ga,In)N) thin films by metalorganic chemical vapor deposition is another active area of research. These materials are used in a wide variety of electronic and optoelectronic devices including high brightness light emitting diodes used in solid state lighting and high frequency/high power transistors for radar and wireless networks. The development of group III-nitride devices is often limited by film cracking which results from intrinsic and extrinsic stress due to lattice and thermal expansion mismatches between the film and substrate. The research is focused on understanding the microstructural mechanisms responsible for film stress and developing strategies to mitigate stress and film cracking. In-situ laser reflectance is used to study dynamic changes in film stress during deposition. This information is correlated to changes in film microstructure and dislocation density measured post-growth and is used to develop models of stress generation and relaxation in the group III-nitride materials system.
Microelectronics, photovoltaics, chemical and biological sensors, light emitting diodes, high frequency/high power electronics.
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